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UID:6a20e3c1df704
DTSTART:20260617T100000Z
SEQUENCE:0
TRANSP:OPAQUE
DTEND:20260617T110000Z
LOCATION:Seminar Room
SUMMARY:ICFO | REBECCA HOFFMANN
CLASS:PUBLIC
DESCRIPTION:High-resolution nanopatterning is central to current research i
 n condensed matter physics and photonics. Examples are electrostatic super
 lattices that engineer the electronic band structure or photonic crystals 
 that control the propagation of light. In both cases\, the phenomena of in
 terest emerge only when nanostructures are patterned with sufficient preci
 sion and minimal disorder. Required feature sizes range from a few nanomet
 ers to micrometers\, and patterned areas span from micrometers to centimet
 ers. Yet across these fields\, a common challenge remains: minimizing patt
 ern disorder.The most widely used nanopatterning methods\, optical and ele
 ctron beam lithography\, are accessible and capable of patterning large ar
 eas with reasonably small pitch. However\, they involve multi-step resist-
 based processing that can limit resolution and introduce contamination\, p
 articularly for sensitive materials. An alternative is the helium focused 
 ion beam (He-FIB)\, a nanofabrication tool that enables direct\, resist-fr
 ee patterning with single-feature sizes of a few nanometers.In this semina
 r\, I will introduce the general working principles of the He-FIB availabl
 e at ICFO and its advantages over conventional lithography techniques. I w
 ill then present a nanopatterning technique based on He-FIB milling of a h
 ard etch mask\, capable of producing periodic two-dimensional arrays in tw
 o-dimensional materials with sub-20 nm pitch and minimal disorder. Finally
 \, I will discuss how this technique can be extended to other material sys
 tems\, its current limitations\, and further applications.
DTSTAMP:20260604T023233Z
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