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BEGIN:VEVENT
UID:6a972b127fd8c
DTSTART:20260930T100000Z
SEQUENCE:0
TRANSP:OPAQUE
DTEND:20260930T110000Z
LOCATION:Elements Room
SUMMARY:ICFO | MARIO HENTSCHEL
CLASS:PUBLIC
DESCRIPTION:ABSTRACT:\nNanophotonics has evolved into a remarkably diverse 
 field\, with applications ranging from optical metasurfaces and integrated
  photonics to quantum technologies and environmental sensing. As the compl
 exity of photonic architectures continues to grow\, so do the demands on n
 anofabrication. While established lithographic approaches provide excellen
 t throughput for mature designs\, they often lack the flexibility required
  for rapid prototyping\, iterative optimization\, and the exploration of u
 nconventional materials and substrates. Ion beam lithography has emerged a
 s a uniquely versatile direct-write fabrication platform that complements 
 conventional cleanroom processes. By enabling maskless patterning with nan
 ometer precision\, it provides rapid design iteration\, direct access to v
 irtually any material system\, and an intrinsic grayscale capability that 
 allows continuous three-dimensional surface profiling in a single fabricat
 ion step. Together\, these characteristics enable photonic structures that
  are difficult or impossible to realize using conventional lithographic wo
 rkflows and open new opportunities for both fundamental research and appli
 cation-driven device development. This seminar will discuss the capabiliti
 es\, advantages\, and practical limitations of ion beam lithography for na
 nophotonic research. Through a series of examples\, I will demonstrate how
  ion beam milling enables the realization of plasmonic and dielectric nano
 structures\, optical metasurfaces\, Mie void resonators\, electron-driven 
 photon sources\, and complex micro- and nanostructured preforms for inject
 ion-compression molding. I will also discuss hybrid fabrication strategies
  that combine ion beam and electron-beam lithography to exploit the streng
 ths of both approaches. Finally\, I will highlight recent developments\, c
 urrent challenges\, and future opportunities for focused ion beam nanofabr
 ication as an enabling technology for next-generation photonic devices.
DTSTAMP:20260901T194418Z
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